Philippe Flückiger
Directeur opérationnel
philippe.fluckiger@epfl.ch +41 21 693 66 95
Nationalité : Swiss
Date de naissance : 13.04.1964
EPFL ENT-R CMI-GE
BM 1125 (Bâtiment BM)
Station 17
CH-1015 Lausanne
+41 21 693 66 95
+41 21 693 57 33
Local: BM 1125
EPFL > ENT-R > CMI > CMI-GE
Domaines de compétences
MEMS
Microelectronics
MicroFabrication
NanoFabrication
Cleanroom Operations
Microelectronics
MicroFabrication
NanoFabrication
Cleanroom Operations
Mission
Director of OperationsEPFL Center of MicroNanoTechnology
Biographie
Since 1999 Philippe Flückiger is the Director of Operations at the EPFL Center of MicroNanoTechnology, a world-class state-of-the-art cleanroom dedicated to research and development in the field of MEMS. He received his diploma in physics from the University of Neuchâtel, Switzerland in 1987 and his PhD from the same University in 1993. His thesis work was dedicated to the deposition, patterning and characterization of high temperature superconductor epitaxial thin films. From 1993 to 1994 he was a post doc at Stanford University to develop submicron lithography with the atomic force microscope in the group of Calvin Quate, inventor of the AFM. From 1995 to 1997 he was successively process engineer, project manager and process engineering manager at Micronas SA in Bevaix, Switzerland, a microelectronics company producing baseband processors and voltage regulators for wireless applications, mostly ASICs for Nokia Mobile Phones. In 1997 he spent 4 months in the production line of EM Microelectronic Marin SA, Switzerland, a semiconductor manufacturer specialized in the design and production of ultra low power, low voltage integrated circuits for battery-operated and field-powered applications. He joined then the Swiss Federal Institute of Technology in Lausanne (EPFL) to start the new activity in diffusion, oxidation and CVD at the Center of MicroNanoTechnology. He was appointed Director of Operations of the Center in 1999.Publications
Publications Infoscience
J. N. Farahani; H.-J. Eisler; D. W. Pohl; M. Pavius; P. Flückiger et al. : Bow-tie optical antenna probes for single-emitter scanning near-field optical microscopy; Nanotechnology. 2007. DOI : 10.1088/0957-4484/18/12/125506.
R. Guerre; C. Hibert; Y. Burri; P. Flückiger; P. Renaud : Fabrication of vertical digital silicon optical micromirrors on suspended electrode for guided-wave optical switching applications; Sensors and Actuators A : Physical. 2005. DOI : 10.1016/j.sna.2005.02.039.
J. Perruisseau-Carrier; R. Fritschi; P. Crespo Valero; C. Hibert; J.-F. Zürcher et al. : Fabrication process and model for a MEMS parallel-plate capacitor above CPW line. 2004. 5th workshop on MEMS for millimeterwave communication (MEMSWAVE2004), Uppsala, Sweden, June 30-July 2, 2004.
R. Fritschi; S. Frederico; C. Hibert; P. Flückiger; P. Renaud et al. : High tuning range AlSi RF MEMS capacitors fabricated with sacrificial amorphous silicon surface micromachining; Microelectronic Engineering. 2004. DOI : 10.1016/S0167-9317(04)00189-3.
A. Luque; J. Quero; C. Hibert; P. Fluckiger : Fabrication process for a microfluidic valve. 2003. p. IV-860-IV-863.
S. Frederico; C. Hibert; R. Fritschi; P. Flückiger; P. Renaud et al. : Silicon sacrificial layer dry etching (SSLDE) for free-standing RF MEMS architectures. 2003. 16th IEEE Annual International Conference on Micro Electro Mechanical Systems, Kyoto, Japan, 19-23 Jan. 2003. p. 570-573.
P. Dainesi; A. M. Ionescu; L. Thévenaz; K. Banerjee; M. J. Declercq et al. : 3-D integrable optoelectronic devices for telecommunications ICs. 2002. IEEE International Solid-State Circuits Conference (ISCC), San Francisco, CA, 3-7 Feb. 2002. p. 360-361. DOI : 10.1109/ISSCC.2002.993081.
A. M. Ionescu; V. Pott; R. Fritschi; K. Banerjee; M. Declercq et al. : Modeling and design of a low-voltage SOI suspended-gate MOSFET (SG- MOSFET) with a metal-over-gate architecture. 2002. 3rd International Symposium on Quality Electronic Design, San Jose, California, Mar 18-21, 2002. p. 496-501.
R. Fritschi; C. Dehollain; M. Declercq; A. M. Ionescu; C. Hibert et al. : A novel RF MEMS technological platform. 2002. 28th Annual Conference of the IEEE Industrial-Electronics-Society, SEVILLE, SPAIN, NOV 05-08, 2002. p. 3052-3056.
P. Dainesi; L. Thévenaz; P. Fluckiger; C. Hibert; G. Racine et al. : A novel CMOS SOI unbalanced Mach-Zehnder interferometer: from design and simulations to fabrication and characterization. 2001. IEEE International SOI Conference, 2001, Durango, CO, USA, 1-4 Oct. 2001. p. 137-138. DOI : 10.1109/SOIC.2001.958024.
P. Dainesi; A. Küng; M. Chabloz; A. Lagos; P. Flückiger et al. : CMOS compatible fully integrated Mach-Zehnder interferometer in SOI technology; IEEE Photonics Technology Letters. 2000. DOI : 10.1109/68.849076.
P. Fluckiger; P. Srivastava; B. Jeanneret; C. Leemann; P. Martinoli : Thermally activated vortex motion in YBa2Cu3O7 wire networks; Physica B: Condensed Matter. 1995.
S. Minne; P. Flueckiger; H. Soh; C. Quate : Atomic force microscope lithography using amorphous silicon as a resist and advances in parallel operation; Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures. 1995. DOI : 10.1116/1.587857.
S. C. Minne; H. T. Soh; P. Flueckiger; C. F. Quate : Fabrication of 0.1 um metal oxide semiconductor field-effect transistors with the atomic force microscope; Applied Physics Letters. 1995.
P. Srivastava; P. Flückiger; C. Leemann; P. Martinoli : Growth and Patterning of YBa2Cu3O7 Films. 1992. EMRS International Conference in Advanced Materials (ICAM91). p. 377.
P. Fluckiger; V. Marsico; P. Srivastava; C. Leemann; P. Martinoli : Magnetoconductance oscillations in high temperature superconducting networks; IEEE Transactions on Magnetics. 1991. DOI : 10.1109/20.133494.
P. Martinoli; P. Flueckiger; V. Marsico; P. Srivastava; C. Leemann et al. : Vortex dynamics in YBa2Cu3O7 films; Physica B: Condensed Matter. 1990.
C. Leemann; P. Flückiger; V. Marsico; J. L. Gavilano; P. K. Srivastava et al. : Percolative behavior of the superconductive transition of YBa2Cu3O7 films; Physical Review Letters. 1990. DOI : 10.1103/PhysRevLett.64.3082.
P. Flueckiger; J.-L. Gavilano; C. Leemann; P. Martinoli; B. Dam et al. : Penetration depth in YBaCuO films; Physica C: Superconductivity. 1989. DOI : 10.1016/0921-4534(89)90823-X.
P. Srivastava; P. Debely; H. Hintermann; C. Leemann; P. Fluckiger et al. : Complex AC conductance of YBaCuO films; IEEE Transactions on Magnetics. 1989. DOI : 10.1109/20.92832.
B. Jeanneret; P. Flückiger; J. L. Gavilano; C. Leemann; P. Martinoli : Critical phase fluctuations in superconducting wire networks; Physical Review B. 1989. DOI : 10.1103/PhysRevB.40.11374.
P. Srivastava; P. Debély; H. Boving; H. Hintermann; P. Flückiger et al. : Growth of RF Magnetron Sputtered YBa2Cu3O7 Thin Films. 1989. p. 361.
B. Jeanneret; P. Fluckiger; C. Leemann; P. Martinoli : Dynamical study of the superconducting phase transition of two-dimensional networks; IEEE Transactions on Magnetics. 1989. DOI : 10.1109/20.92564.