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Rémy Juttin

remy.juttin@epfl.ch

EPFL CMI
BM 1127 (Bâtiment BM)
Station 17
1015 Lausanne

Electrical Resistivity and Residual Stress in Sputtered Indium Tin Oxide Thin Films

J. Liang; J. Zhang; K. Johanns; O. Amster; B. Cuénod  et al.

EDFA Technical Articles. 2025. DOI : 10.31399/asm.edfa.2025-3.p004.

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Piezoelectric and elastic properties of Al0.60Sc0.40N thin films deposited on patterned metal electrodes

M. Liffredo; N. Xu; S. Stettler; F. Peretti; L. G. Villanueva

Journal of Vacuum Science & Technology. 2024. DOI : 10.1116/6.0003497.

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Quantitative study of the thickness-dependent stress in indium tin oxide thin films

J. Liang; J. Zhang; K. Johanns; K. Rubin; W. Johnson  et al.

Thin Solid Films. 2023. DOI : 10.1016/j.tsf.2023.140163.

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Combination of thermal scanning probe lithography and ion etching to fabricate 3D silicon nanopatterns with extremely smooth surface

Y. Lisunova; J. Brugger

Microelectronic Engineering. 2018. DOI : 10.1016/j.mee.2018.02.012.

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High-aspect ratio nanopatterning via combined thermal scanning probe lithography and dry etching

Y. Lisunova; M. Spieser; R. Juttin; F. Holzner; J. Brugger

Microelectronic Engineering. 2017. DOI : 10.1016/j.mee.2017.04.006.

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