Ye Pu

EPFL STI DLL-STI
MED 3 1019 (Bâtiment MED)
Station 9
1015 Lausanne

EPFL STI DLL-STI
ME B2 495 (Bâtiment ME)
Station 9
1015 Lausanne

EPFL STI IEM LAPD
BM 4124 (Bâtiment BM)
Station 17
1015 Lausanne

11/2008 - Present: Postdoctoral scientist, Swiss Federal Institute of Technology at Lausanne (École Polytechnique Fédérale de Lausanne, EPFL) 02/2003 - 10/2008: Postdoctoral scholar, California Institute of Technology 07/1999 - 01/2003: Ph.D. studies, State University of New York at Buffalo (SUNY Buffalo) 11/1995 – 06/1999: M.S. studies, Kansas State University Full CV

PATENTS

1. Ye Pu and Demetri Psaltis, "Method of nonlinear harmonic holography", US Patent 7,813,016, October 12, 2010. 2. Hui Meng and Ye Pu, "Particle image velocimetry apparatus and methods", U.S. Patent 6,496,262 B1, December 17, 2002.

Education

Ph.D.

| Mechanical Engineering

2002 – 2002 State University of New York, Buffalo NY, USA
Directed by Hui Meng

M.S.

| Mechanical Engineering

1998 – 1998 Kansas State University, Manhattan KS, USA
Directed by Hui Meng

B.S.

| Optical Engineering

1992 – 1992 Zhejiang University, Hangzhou, China

SELECTED PUBLICATIONS

Teaching & PhD

Past EPFL PhD Students as codirector

Xin Yang, Giulia Panusa

Courses

Advanced additive manufacturing technologies

MICRO-413

Advanced 3D forming techniques for high throughput and high resolution (nanometric) for large scale production. Digital manufacturing of functional layers, microsystems and smart systems.

Advanced microfabrication practicals

MICRO-373

This TP allows for in-depth training on advanced micro and nanofabrication methods in a clean-room environment for selected applications, gain deeper knowledge in MEMS/NEMS processes, work in a small group together with PhD students/postdocs during 14 weeks touching all aspects of a microprocess.

Optical design with ZEMAX

MICRO-517

Introduction to computer-aided design of optical systems using "ZEMAX OpticStudio" optical design software. Principles of optical systems design and performance analysis with geometrical optics and raytracing. Evaluation and minimization of optical aberrations in an optical design.

Optics laboratories (autumn)

MICRO-424

This laboratory work allows students to deepen their understanding of optical instruments, optoelectronic devices and diagnostic methods. Students will be introduced in state of the art optical instruments and measurement principles.

Optics laboratories (spring)

MICRO-423

This laboratory work allows students to deepen their understanding of optical instruments, optoelectronic devices and diagnostic methods. Students will be introduced in state of the art optical instruments and measurement principles.