Rémy Juttin
Process Engineer
EPFL CMI
BM 1127 (Bâtiment BM)
Station 17
1015 Lausanne
+41 21 693 68 29
Office:
BM 1127
EPFL
>
VPA-AVP-CP
>
CMI
>
CMI-GE
Fields of expertise
Micro & nano fabrication:
- Physical Vapor Deposition (PVD)
- Etching
- Metrology
Publications
Infoscience publications
Electrical Resistivity and Residual Stress in Sputtered Indium Tin Oxide Thin Films
EDFA Technical Articles. 2025. DOI : 10.31399/asm.edfa.2025-3.p004.Piezoelectric and elastic properties of Al0.60Sc0.40N thin films deposited on patterned metal electrodes
Journal of Vacuum Science & Technology. 2024. DOI : 10.1116/6.0003497.Quantitative study of the thickness-dependent stress in indium tin oxide thin films
Thin Solid Films. 2023. DOI : 10.1016/j.tsf.2023.140163.Combination of thermal scanning probe lithography and ion etching to fabricate 3D silicon nanopatterns with extremely smooth surface
Microelectronic Engineering. 2018. DOI : 10.1016/j.mee.2018.02.012.High-aspect ratio nanopatterning via combined thermal scanning probe lithography and dry etching
Microelectronic Engineering. 2017. DOI : 10.1016/j.mee.2017.04.006.Other publications
ELECTRICAL RESISTIVITY AND RESIDUAL STRESS IN SPUTTERED INDIUM TIN OXIDE THIN FILMS
Jianhui Liang, Jiali Zhang, Kurt Johanns, Oskar Amster, Blaise Cuénod, and Rémy Juttin
Electronic Device Failure Analysis (EDFA)
EDFAAO (2025) 3:4-9